Clean room and other equipments

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We have a clean room and equipment for sample fabrication. It requires knowledge both from Physics and Chemistry, and the operation of many instruments to produce high quality samples.


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Inside the clean room. This is a radio frequency shielded clean room, which is essentially a big metal box made of steel. In the picture you can see the DI water filter, HEPA air filter, Headway Research EC101DT Series Photo Resist Spinner and chemical handling bench. There are also some equipments on the right hand side bench, such as hot plate, ultrasonic cleaners, and the BIORAD RC2400 Alloying Furnace (for annealing of the Ohmic contact).

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The newly installed XE-100 Atomic Force Microscope (AFM). On the left are the image display/processing computer and controlling electronics box; on the right side, there are the AFM with the acoustic enclosure and the TV monitor. Under the AFM is the Minus K Technology BM-6 Bench Top Vibration Isolation Platform, which, together with the underlying heavy granite table, significantly reduces vibrations coming from the enviroment.

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A closer look at the AFM.

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The sample fabrication bench. Many of the sample "making" processes are done on this bench, these including optical lithography, preparing Ohmic contacts, connecting Ohmic contacts and gates to header electrodes and so on. Some of these operations are quite delicate and requiring good precision, and are typically carried out under the microsope.

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The old cryostat. We rarely use it now, because its function is much limited compared with the new dilution refrigerator system.

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This is our Edwards Auto 306 e-beam 4 source evaporator system. The system is operated under high vacuum around 10-7 torr. We use this machine to evaporate thin metal films (typically gold on titanium) onto the sample surface, which after lift-off will act as the gate electrodes.

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A different angle. You can also see the high voltage power supply for e-beam (the white box under the bench). On the bench, there is the Plasma Science RIE-200W reactive ion etch system.